Concurrent Design approaches Nanotechnology Tool Design from the Nanoscale Defintion of Nanotech. (100nm and smaller) as opposed to Feynmen / Drexler Nanotechnology (assembly of atomically precise structures). Our experience in Semiconductor Capital Equipment Design has naturally migrated into Tools for Nanotechnology as well as MEMS and NEMS applications.

Our experience in sub-micron and nano tool machine design, early stage tool development, prototyping and nanotechnology equipment design along with the requisite high level of Engineering Analysis provides the complete skill set for partnering with many clients who are focused on core technologies and intellectual property for nanotechnology tools.

Concurrent Design is active in Semiconductor Equipment and Materials International's Steering Committee and has been active in the development of SEMI's NanoForum Conferences.

Nanotechnology Equipment Design -
Step and Flash Imprint Lithography Tool (SFIL) Client:Molecular Imprints

Nanotechnology Tool Design
Wafer Chuck for Short Wavelength Metrology
Client: MetroSol

Concurrent Design’s office is located in Austin, Texas. We support clients in Austin and Central Texas along with Regional, National and International clients. We provide CAD Services utilizing SolidWorks™ and ProEngineer™. (SolidWorks is a Registered Trademark of SolidWorks Corp., a Dassault Systèmes Company) (Pro/E, Pro/ENGINEER, Wildfire are registered trademarks of PTC, Parametric Technology Corp.)

11500 Metric Boulevard, Suite #190, Austin, Texas 78758,
Toll Free: 877-219-8501 Local: 512-219-8501 Fax: 512-219-0565

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